Low-hydrogen-content silicon nitride deposited at room temperature by inductively coupled plasma deposition

Zhou, Haiping, Elgaid, Khaled ORCID: https://orcid.org/0000-0003-3265-1097, Wilkinson, Chris and Thayne, Iain 2006. Low-hydrogen-content silicon nitride deposited at room temperature by inductively coupled plasma deposition. Japanese Journal of Applied Physics 45 (10B) , 8388. 10.1143/JJAP.45.8388

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Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Schools > Engineering
ISSN:	0021-4922
Last Modified:	23 Oct 2022 13:03
URI:	https://orca.cardiff.ac.uk/id/eprint/109536

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