Zhou, Haiping, Elgaid, Khaled ORCID: https://orcid.org/0000-0003-3265-1097, Wilkinson, Chris and Thayne, Iain 2006. Low-hydrogen-content silicon nitride deposited at room temperature by inductively coupled plasma deposition. Japanese Journal of Applied Physics 45 (10B) , 8388. 10.1143/JJAP.45.8388 |
Official URL: http://dx.doi.org/10.1143/JJAP.45.8388
Item Type: | Article |
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Date Type: | Publication |
Status: | Published |
Schools: | Engineering |
ISSN: | 0021-4922 |
Last Modified: | 23 Oct 2022 13:03 |
URI: | https://orca.cardiff.ac.uk/id/eprint/109536 |
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