The electron-phonon relaxation time in thin superconducting titanium nitride films

Kardakova, A., Finkel, M., Morozov, Dmitry L., Kovalyuk, V., An, P., Dunscombe, Christopher John, Tarkhov, M., Mauskopf, Philip Daniel ORCID: https://orcid.org/0000-0001-6397-5516, Klapwijk, T. M. and Goltsman, G. 2013. The electron-phonon relaxation time in thin superconducting titanium nitride films. Applied Physics Letters 103 (25) , 252602. 10.1063/1.4851235

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Abstract

We report on the direct measurement of the electron-phonon relaxation time, τeph, in disordered TiN films. Measured values of τeph are from 5.5 ns to 88 ns in the 4.2 to 1.7 K temperature range and consistent with a T−3 temperature dependence. The electronic density of states at the Fermi level N0 is estimated from measured material parameters. The presented results confirm that thin TiN films are promising candidate-materials for ultrasensitive superconducting detectors.

Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Physics and Astronomy
Subjects:	Q Science > QC Physics
Additional Information:	Pdf uploaded in accordance with publisher's policy at http://www.sherpa.ac.uk/romeo/issn/0003-6951/ (accessed 20/02/2014).
Publisher:	American Institute of Physics
ISSN:	0003-6951
Date of First Compliant Deposit:	30 March 2016
Last Modified:	23 May 2023 03:57
URI:	https://orca.cardiff.ac.uk/id/eprint/53929

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