Novel patterning method for the electrochemical production of etched silicon

Shapley, J. D. L. and Barrow, David Anthony ORCID: https://orcid.org/0000-0003-2096-7262 2001. Novel patterning method for the electrochemical production of etched silicon. Thin Sold Films 388 (1-2) , pp. 134-137. 10.1016/S0040-6090(01)00823-9

Full text not available from this repository.

Item Type:	Article
Schools:	Schools > Engineering
ISSN:	0040-6090
Last Modified:	17 Oct 2022 10:27
URI:	https://orca.cardiff.ac.uk/id/eprint/8099

Citation Data

Cited 25 times in Scopus. View in Scopus. Powered By Scopus® Data

Actions (repository staff only)

Edit Item