Cardiff University | Prifysgol Caerdydd ORCA
Online Research @ Cardiff 
WelshClear Cookie - decide language by browser settings

FIB sputtering optimization using Ion Reverse Software

Svintsov, A., Zaitsev, S., G., Lalev, Dimov, Stefan Simeonov, Velkova, V. and Hirshy, Hassan ORCID: https://orcid.org/0000-0003-0281-3681 2009. FIB sputtering optimization using Ion Reverse Software. Microelectronic Engineering 86 (4-6) , pp. 544-547. 10.1016/j.mee.2009.01.073

Full text not available from this repository.

Abstract

This paper experimentally demonstrates that a quantitative description of focused ion beam (FIB) milling (at least for several 3D profiles with inclination not higher than 45°) can be done by means of an isotropic local etching model. Specific characteristic of this model is that it does not account for re-deposition. The paper also presents IonRevSim – Software developed specifically for data preparation and prediction of the shape of the FIB machined structures. Those functions and their operating modes are discussed here in detail and FIB experimental results are provided to verify the algorithms embedded in the software.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Engineering
Subjects: Q Science > QA Mathematics > QA75 Electronic computers. Computer science
T Technology > TA Engineering (General). Civil engineering (General)
Uncontrolled Keywords: FIB; 3D ion patterning; Etching simulation; Software
Publisher: Elsevier
ISSN: 0167-9317
Last Modified: 17 Oct 2022 10:32
URI: https://orca.cardiff.ac.uk/id/eprint/8393

Citation Data

Cited 11 times in Scopus. View in Scopus. Powered By Scopus® Data

Actions (repository staff only)

Edit Item Edit Item