FIB sputtering optimization using Ion Reverse Software

Svintsov, A., Zaitsev, S., G., Lalev, Dimov, Stefan Simeonov, Velkova, V. and Hirshy, Hassan ORCID: https://orcid.org/0000-0003-0281-3681 2009. FIB sputtering optimization using Ion Reverse Software. Microelectronic Engineering 86 (4-6) , pp. 544-547. 10.1016/j.mee.2009.01.073

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Abstract

This paper experimentally demonstrates that a quantitative description of focused ion beam (FIB) milling (at least for several 3D profiles with inclination not higher than 45°) can be done by means of an isotropic local etching model. Specific characteristic of this model is that it does not account for re-deposition. The paper also presents IonRevSim – Software developed specifically for data preparation and prediction of the shape of the FIB machined structures. Those functions and their operating modes are discussed here in detail and FIB experimental results are provided to verify the algorithms embedded in the software.

Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Engineering
Subjects:	Q Science > QA Mathematics > QA75 Electronic computers. Computer science T Technology > TA Engineering (General). Civil engineering (General)
Uncontrolled Keywords:	FIB; 3D ion patterning; Etching simulation; Software
Publisher:	Elsevier
ISSN:	0167-9317
Last Modified:	17 Oct 2022 10:32
URI:	https://orca.cardiff.ac.uk/id/eprint/8393

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