Coplanar waveguide transmission lines and high Q inductors on CMOS grade silicon using photoresist and polyimide

Ternent, G., Ferguson, S., Borsosfoldi, Z., Elgaid, Khaled ORCID: https://orcid.org/0000-0003-3265-1097, Lohdi, T., Edgar, D., Wilkinson, C.D.W. and Thayne, I.G. 1999. Coplanar waveguide transmission lines and high Q inductors on CMOS grade silicon using photoresist and polyimide. Electronics letters 35 (22) , pp. 1957-1958. 10.1049/el:19991298

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Abstract

Gold coplanar waveguide (CPW) transmission lines with losses of <0.5 dB/mm at 60 GHz have been produced on CMOS grade silicon substrates using a 15 /spl mu/m thick layer of either photoresist or polyimide. This process, together with an electroplated interconnect technique, has been used to produce spiral inductors on a 2 /spl Omega//cm n-Si substrate with a Q of 15 and L of 1.2 nH at 6 GHz

Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Engineering
Publisher:	Institution of Engineering & Technology
ISSN:	0013-5194
Last Modified:	23 Oct 2022 13:03
URI:	https://orca.cardiff.ac.uk/id/eprint/109551

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