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Pulse profiling active load pull measurements

Alimohammadi, Yashar, Kuwata, Eigo, Liu, Xuan, Husseini, Thoalfukar, Bell, James, Wu, Lei, Tasker, Paul and Benedikt, Johannes 2020. Pulse profiling active load pull measurements. Presented at: IEEE/MTT-S International Microwave Symposium (IMS 2020), Los Angeles, CA, USA, 4-6 August 2020. 2020 IEEE/MTT-S International Microwave Symposium (IMS). IEEE, pp. 759-762. 10.1109/IMS30576.2020.9223989

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An advanced active load-pull pulse profiling (ALPPP) system is presented to identify and track, for the first time, the optimum impedances along different sections of an RF pulse. Optimum impedance variations of a 10W GaN device within the RF pulse, and the resulting performance variations are quantified over an output power range of 25 dB showing a significant variation at power back-off. Furthermore, the nature of optimum load variations is probed through the addition of a pulsed IV capability. Pre-bias is utilized to investigate the impact of traps on device behavior over a range of temperature and drive power levels. It is demonstrated that pre-filling the traps provides for an almost constant load optimum across the RF pulse while maintaining device performance. Moreover, the identified optimum pre-bias condition, shows improved device linearity over the duration of the RF pulse, hence, suggesting a new method for compensating impedance mismatches and improving device linearity within an RF pulse.

Item Type: Conference or Workshop Item (Paper)
Date Type: Published Online
Status: Published
Schools: Engineering
Publisher: IEEE
ISBN: 9781728168159
ISSN: 2576-7216
Last Modified: 06 Nov 2020 15:00

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