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VCSEL quick fabrication of 894.6 nm wavelength epi‐material for miniature atomic clock applications

Baker, Jack, Allford, Craig. P. ORCID:, Gillgrass, Sara., Peach, Tomas., Meiklejohn, James, Hentschel, Curtis, Meredith, Wyn, Powell, Denise, Sweet, Tracy ORCID:, Haji, Mohsin, Davies, J. Iwan, Shutts, Samuel ORCID: and Smowton, Peter M. ORCID: 2022. VCSEL quick fabrication of 894.6 nm wavelength epi‐material for miniature atomic clock applications. IET Optoelectronics 10.1049/ote2.12082

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A vertical cavity surface emitting laser (VCSEL) quick fabrication (VQF) process is applied to epitaxial materials designed for miniature atomic clock applications (MACs). The process is used to assess material quality and uniformity of a full 100 mm (4‐inch) wafer against the stringent target specification of VCSELs for MACs. Target specifications in optical power (>0.6 mW) and differential efficiencies (<0.5 W/A) are achieved over large portions of a wafer; however, the variation in the oxide aperture diameter is shown to limit the yield. The emission of the fundamental mode at 894.6 nm at 70 ℃ ${}^{\circ}\mathrm{C}$ is met over a significant area of the wafer for ∼4 μ $\mu $ m aperture multi‐mode devices. The consideration of the on‐wafer variation reveals that further optimisation is required to increase the device yield to levels required for volume manufacture.

Item Type: Article
Date Type: Published Online
Status: Published
Schools: Physics and Astronomy
Additional Information: License information from Publisher: LICENSE 1: URL:
Publisher: Institution of Engineering and Technology (IET)
ISSN: 1751-8768
Funders: EPSRC
Date of First Compliant Deposit: 17 November 2022
Date of Acceptance: 14 October 2022
Last Modified: 11 Oct 2023 21:14

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