Isotropic sub-100nm direct laser writing using spherical reflector-enabled 4Pi excitation at 405nm wavelength

Payne, Lukas, Askey, Joseph, Pitsios, Ioannis, Ladak, Sam ORCID: https://orcid.org/0000-0002-0275-0927 and Langbein, Wolfgang ORCID: https://orcid.org/0000-0001-9786-1023 2024. Isotropic sub-100nm direct laser writing using spherical reflector-enabled 4Pi excitation at 405nm wavelength. Presented at: SPIE Photonics Europe 2024, Strasbourg, France, 26-30 April 2024. Proceedings 3D Printed Optics and Additive Photonic Manufacturing IV. , vol.12995 SPIE, p. 3. 10.1117/12.3021957

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Abstract

We demonstrate a direct laser writing setup combining 405 nm multi-photon lithography with 4Pi excitation enabled by a spherical reflector (SR) refocussing the transmitted excitation. The SR provides a simplified implementation of the 4Pi geometry, avoiding the need for an additional objective and its interferometrically stabilised excitation beam path, while also recycling the beam power. The reflected beam position is measured by imaging the reflected beam and is controlled by a feedback loop to 10nm in all three dimensions. Using this instrument, the fabrication of sinusoidally modulated nanowires and helicoids with sub-100nm near-isotropic cross-section is demonstrated.

Item Type:	Conference or Workshop Item (Paper)
Date Type:	Published Online
Status:	Published
Schools:	Physics and Astronomy
Publisher:	SPIE
Last Modified:	19 Jul 2024 10:16
URI:	https://orca.cardiff.ac.uk/id/eprint/170162

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