Multiphoton lithography and deposition for realizing 3D magnetic nanowires and nanostructures

Askey, Joseph and Ladak, Sam ORCID: https://orcid.org/0000-0002-0275-0927 2026. Multiphoton lithography and deposition for realizing 3D magnetic nanowires and nanostructures. Vázquez, Manuel, ed. Magnetic Nano- and Microwires: Design, Synthesis, Properties and Applications (3rd edition), Woodhead Publishing Series in Electronic and Optical Materials, Elsevier, pp. 29-59. (10.1016/b978-0-443-36534-8.01002-2)

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Abstract

Three-dimensional (3D) printing using multiphoton lithography (MPL) is a maturing technology for the realization of complex and free-form 3D nanostructures with sub-100 nm feature size and micron to millimeter-scale footprint. The adoption of this technology for fabricating magnetic nanostructures and nanowires is becoming more widespread with improvements in achievable feature size, sample throughput, and an increasingly diverse suite of deposition techniques for magnetic functionalization of the printed organic scaffolds. In this chapter, we summarize the underlying physics of MPL, recent work in realizing 3D geometries using a range of photoresist types combined with a range of physical and chemical deposition techniques. The work presented here marks a significant advancement in the widespread use of MPL as a standardized, efficient, and versatile technology for realizing 3D magnetic nanowires and nanostructures of arbitrary geometry.

Item Type:	Book Section
Date Type:	Publication
Status:	Published
Schools:	Schools > Physics and Astronomy
Publisher:	Elsevier
ISBN:	9780443365348
Last Modified:	02 Aug 2026 18:50
URI:	https://orca.cardiff.ac.uk/id/eprint/186510

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