Comparative research fluorine and colloidal aggregate formation on the surface lithium fluoride thin films during electronic, ionic and thermal treatments

Sharopov, Utkirjon, Abdusalomov, Abduzokhidkhuja, Kakhramonov, Alisher, Rashidov, Karim, Akbarova, Feruza, Turapova, Sitora, Kurbanov, Muzaffar, Saidov, Dilmurod, Egamberdiev, Bahrom, Komolov, Aleksei, Pshenichnyuk, Stanislav, Kaur, Kulwinder and Bandarenka, Hanna ORCID: https://orcid.org/0000-0003-4254-8261 2023. Comparative research fluorine and colloidal aggregate formation on the surface lithium fluoride thin films during electronic, ionic and thermal treatments. Vacuum 213 , 112133. 10.1016/j.vacuum.2023.112133

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Abstract

In this study, we present the results of our investigation of fluorine and colloidal aggregate formation in the LiF/Si(111) system as a function of substrate temperature and electron and ion beams. Excitons generated by electron or ion irradiation will form a stable F-H pair, which subsequently forms aggregate centres before their coalescence into fluoride and colloidal macromolecules. Additionally, after annealing the LiF film, colloids and anionic complexes are formed on the surface. The experimental data show the formation of colloids after 5 min of annealing at a temperature of 75 °C. Furthermore, when the LiF films annealed at a temperature of 400 °C, chemical reactions on the surface, such as the formation of silicide, are excited. The obtained experimental data show that an increase in the target temperature during the formation of primary point defects and their association can be represented by the migration of their components on the surface.

Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Schools > Physics and Astronomy
Publisher:	Elsevier
ISSN:	0042-207X
Date of Acceptance:	25 April 2023
Last Modified:	07 Sep 2026 21:52
URI:	https://orca.cardiff.ac.uk/id/eprint/188536

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