Cardiff University | Prifysgol Caerdydd ORCA
Online Research @ Cardiff 
WelshClear Cookie - decide language by browser settings

Pattern formation on silicon by laser-initiated liquid-assisted colloidal lithography

Ulmeanu, M., Petkov, Petko ORCID: https://orcid.org/0000-0003-2185-2651, Ursescu, D., Maraloiu, V. A., Jipa, F., Brousseau, Emmanuel Bruno Jean Paul ORCID: https://orcid.org/0000-0003-2728-3189 and Ashfold, M. N. R. 2015. Pattern formation on silicon by laser-initiated liquid-assisted colloidal lithography. Nanotechnology 26 (45) , 455303. 10.1088/0957-4484/26/45/455303

Full text not available from this repository.

Abstract

We report sub-diffraction limited patterning of Si substrate surfaces by laser-initiated liquid-assisted colloidal lithography. The technique involves exposing a two-dimensional lattice of transparent colloidal particles spin coated on the substrate of interest (here Si) immersed in a liquid (e.g. methanol, acetone, carbon tetrachloride, toluene) to a single picosecond pulse of ultraviolet laser radiation. Surface patterns formed using colloidal particles with different radii in the range 195 nm ≤ R ≤ 1.5 μm and liquids with differing indices of refraction (n liquid) are demonstrated, the detailed topographies of which are sensitively dependent upon whether the index of refraction of the colloidal particle (n colloid) is greater or smaller than n liquid (i.e. upon whether the incident light converges or diverges upon interaction with the particle). The spatial intensity modulation formed by diffraction of the single laser pulse by the colloidal particles is imprinted into the Si substrate.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Centre for Advanced Manufacturing Systems At Cardiff (CAMSAC)
Engineering
Subjects: T Technology > TS Manufactures
Publisher: IOP Publishing
ISSN: 0957-4484
Last Modified: 31 Oct 2022 08:56
URI: https://orca.cardiff.ac.uk/id/eprint/79288

Citation Data

Cited 4 times in Scopus. View in Scopus. Powered By Scopus® Data

Actions (repository staff only)

Edit Item Edit Item