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Pattern formation on silicon by laser-initiated liquid-assisted colloidal lithography

Ulmeanu, M., Petkov, Petko ORCID:, Ursescu, D., Maraloiu, V. A., Jipa, F., Brousseau, Emmanuel Bruno Jean Paul ORCID: and Ashfold, M. N. R. 2015. Pattern formation on silicon by laser-initiated liquid-assisted colloidal lithography. Nanotechnology 26 (45) , 455303. 10.1088/0957-4484/26/45/455303

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We report sub-diffraction limited patterning of Si substrate surfaces by laser-initiated liquid-assisted colloidal lithography. The technique involves exposing a two-dimensional lattice of transparent colloidal particles spin coated on the substrate of interest (here Si) immersed in a liquid (e.g. methanol, acetone, carbon tetrachloride, toluene) to a single picosecond pulse of ultraviolet laser radiation. Surface patterns formed using colloidal particles with different radii in the range 195 nm ≤ R ≤ 1.5 μm and liquids with differing indices of refraction (n liquid) are demonstrated, the detailed topographies of which are sensitively dependent upon whether the index of refraction of the colloidal particle (n colloid) is greater or smaller than n liquid (i.e. upon whether the incident light converges or diverges upon interaction with the particle). The spatial intensity modulation formed by diffraction of the single laser pulse by the colloidal particles is imprinted into the Si substrate.

Item Type: Article
Date Type: Publication
Status: Published
Schools: Centre for Advanced Manufacturing Systems At Cardiff (CAMSAC)
Subjects: T Technology > TS Manufactures
Publisher: IOP Publishing
ISSN: 0957-4484
Last Modified: 31 Oct 2022 08:56

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