Silica based polishing of {100} and {111} single crystal diamond

Thomas, Evan L. H., Mandal, Soumen ORCID: https://orcid.org/0000-0001-8912-1439, Brousseau, Emmanuel Bruno Jean Paul ORCID: https://orcid.org/0000-0003-2728-3189 and Williams, Oliver Aneurin ORCID: https://orcid.org/0000-0002-7210-3004 2014. Silica based polishing of {100} and {111} single crystal diamond. Science and Technology of Advanced Materials 15 (3) , pp. 1-7. 10.1088/1468-6996/15/3/035013

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Abstract

Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.

Item Type:	Article
Date Type:	Published Online
Status:	Published
Schools:	Centre for Advanced Manufacturing Systems At Cardiff (CAMSAC) Engineering Physics and Astronomy
Subjects:	Q Science > QC Physics T Technology > TA Engineering (General). Civil engineering (General)
Additional Information:	Pdf uploaded in accordance with the publisher’s policy at http://www.sherpa.ac.uk/romeo/issn/1468-6996/(accessed 10/07/2014)
Publisher:	Institute of Physics
ISSN:	1468-6996
Funders:	EPSRC
Date of First Compliant Deposit:	30 March 2016
Date of Acceptance:	4 June 2014
Last Modified:	06 Jan 2024 02:38
URI:	https://orca.cardiff.ac.uk/id/eprint/60956

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