Thomas, Evan L. H., Mandal, Soumen  ORCID: https://orcid.org/0000-0001-8912-1439, Brousseau, Emmanuel Bruno Jean Paul ORCID: https://orcid.org/0000-0003-2728-3189 and Williams, Oliver Aneurin ORCID: https://orcid.org/0000-0002-7210-3004
2014.
Silica based polishing of {100} and {111} single crystal diamond.
Science and Technology of Advanced Materials
15
(3)
, pp. 1-7.
10.1088/1468-6996/15/3/035013
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Official URL: http://dx.doi.org/10.1088/1468-6996/15/3/035013
Abstract
Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.
| Item Type: | Article |
|---|---|
| Date Type: | Published Online |
| Status: | Published |
| Schools: | Research Institutes & Centres > Centre for Advanced Manufacturing Systems At Cardiff (CAMSAC) Schools > Engineering Schools > Physics and Astronomy |
| Subjects: | Q Science > QC Physics T Technology > TA Engineering (General). Civil engineering (General) |
| Additional Information: | Pdf uploaded in accordance with the publisher’s policy at http://www.sherpa.ac.uk/romeo/issn/1468-6996/(accessed 10/07/2014) |
| Publisher: | Institute of Physics |
| ISSN: | 1468-6996 |
| Funders: | EPSRC |
| Date of First Compliant Deposit: | 30 March 2016 |
| Date of Acceptance: | 4 June 2014 |
| Last Modified: | 06 Jan 2024 02:38 |
| URI: | https://orca.cardiff.ac.uk/id/eprint/60956 |
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