Epitaxial growth of high quality WO3 thin films

Leng, X., Pereiro, J. ORCID: https://orcid.org/0000-0002-2582-3498, Strle, J., Bollinger, A. T. and Bozovic, I. 2015. Epitaxial growth of high quality WO3 thin films. APL Materials 3 (9) , 096102. 10.1063/1.4930214

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Abstract

We have grown epitaxial WO3 films on various single-crystal substrates using radio frequency magnetron sputtering. While pronounced surface roughness is observed in films grown on LaSrAlO4 substrates, films grown on Y AlO3 substrates show atomically flat surfaces, as demonstrated by atomic force microscopy and X-ray diffraction (XRD) measurements. The crystalline structure has been confirmed to be monoclinic by symmetric and skew-symmetric XRD. The dependence of the growth modes and the surface morphology on the lattice mismatch are discussed.

Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Physics and Astronomy
Subjects:	Q Science > QC Physics
Uncontrolled Keywords:	Epitaxy; Surface morphology; Thin film growth; X-ray diffraction; Crystal structure
Publisher:	AIP Publishing
ISSN:	2166-532X
Funders:	Department of Energy, USA
Date of First Compliant Deposit:	22 September 2016
Date of Acceptance:	25 August 2015
Last Modified:	04 May 2023 21:53
URI:	https://orca.cardiff.ac.uk/id/eprint/94207

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