Demchenko, Iraida N., Melikhov, Yevgen  ORCID: https://orcid.org/0000-0002-9787-5238, Syryanyy, Yevgen, Zaytseva, Irina, Konstantynov, Pavlo and Chernyshova, Maryna
2018.
Effect of argon sputtering on XPS depth-profiling results of Si/Nb/Si.
Journal of Electron Spectroscopy and Related Phenomena
224
, pp. 17-22.
10.1016/j.elspec.2017.09.009
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Abstract
Ultrathin Si/Nb/Si trilayer is an excellent example of a system for which dimensionality effects, together with other factors like type of a substrate material and growth method, influence strongly its superconducting properties. This study offers some important insights into experimental investigation of density of states of such a system with the aim to identify an electronic structure of the interface as a function of niobium layer thickness. For that, two Si/Nb/Si trilayers with 9.5 and 1.3 nm thick niobium layer buried in amorphous silicon were studied using high-resolution (HR) XPS depth-profile techniques. Strong influence of sputtering was observed, which resulted in severe intermixture of Si and Nb atoms. Nevertheless, a sharp top interface and metallic phase of niobium were detected for the thicker layer sample. On the contrary, a Nb-rich mixed alloy at top interface was observed for the thinner layer sample.
| Item Type: | Article |
|---|---|
| Date Type: | Publication |
| Status: | Published |
| Schools: | Schools > Engineering |
| Subjects: | Q Science > QC Physics |
| Publisher: | Elsevier |
| ISSN: | 0368-2048 |
| Date of First Compliant Deposit: | 1 November 2017 |
| Date of Acceptance: | 21 September 2017 |
| Last Modified: | 02 Dec 2024 16:00 |
| URI: | https://orca.cardiff.ac.uk/id/eprint/105799 |
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