50-nm self-aligned and 'standard' T-gate InP pHEMT comparison: the influence of parasitics on performance at the 50-nm node

Moran, David A. J., McLelland, Helen, Elgaid, Khaled ORCID: https://orcid.org/0000-0003-3265-1097, Whyte, Griogair, Stanley, Colin R. and Thayne, Iain 2006. 50-nm self-aligned and 'standard' T-gate InP pHEMT comparison: the influence of parasitics on performance at the 50-nm node. IEEE Transactions of Electron Devices 53 (12) , pp. 2920-2925. 10.1109/TED.2006.885674

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Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Schools > Engineering
Publisher:	IEEE
ISSN:	0018-9383
Last Modified:	23 Oct 2022 13:03
URI:	https://orca.cardiff.ac.uk/id/eprint/109535

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