Elgaid, Khaled ![]() |
Official URL: http://dx.doi.org/10.1049/el:19991104
Abstract
The authors show that in a GaAs HEMT-based monolithic millimetre-wave integrated circuit process flow, prior to gate metallisation the introduction of a hydrofluoric acid cleaning process after gate recess etching results in a significant reduction in the Schottky diode turn-on voltage, series resistance and bias dependent RF junction resistance
Item Type: | Article |
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Date Type: | Publication |
Status: | Published |
Schools: | Engineering |
Publisher: | Institution of Engineering & Technology |
ISSN: | 0013-5194 |
Last Modified: | 23 Oct 2022 13:03 |
URI: | https://orca.cardiff.ac.uk/id/eprint/109550 |
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