Very high perfonnance 50 nm T-gate III-V HEMTs enabled by robust nanofabrication technologies

Thayne, I., Cao, X., Moran, D., Boyd, E., Elgaid, Khaled ORCID: https://orcid.org/0000-0003-3265-1097, McLelland, H., Holland, M., Thoms, S. and Stanley, C. 2004. Very high perfonnance 50 nm T-gate III-V HEMTs enabled by robust nanofabrication technologies. Presented at: 4th IEEE Conference on Nanotechnology, 2004, Munich, 16-19 August 2004. p. 95. 10.1109/NANO.2004.1392261

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Item Type:	Conference or Workshop Item (Paper)
Date Type:	Submission
Status:	Unpublished
Schools:	Engineering
Last Modified:	23 Oct 2022 13:04
URI:	https://orca.cardiff.ac.uk/id/eprint/109573

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