Hybrid diamond/silicon suspended integrated photonic platform using SF6 isotropic etching

Panduranga, Parashara, Abdou, Aly, Richter, Jens, Thomas, Evan L. H., Mandal, Soumen ORCID: https://orcid.org/0000-0001-8912-1439, Ren, Zhong, Pedersen, Rasmus H., Williams, Oliver A. ORCID: https://orcid.org/0000-0002-7210-3004, Witzens, Jeremy and Nezhad, Maziar P. 2019. Hybrid diamond/silicon suspended integrated photonic platform using SF6 isotropic etching. Presented at: 2nd IEEE British and Irish Conference on Optics and Photonics (BICOP 2019), London, England, 11-13 December 2019. 2019 IEEE 2nd British and Irish Conference on Optics and Photonics (BICOP). IEEE, pp. 1-4. 10.1109/BICOP48819.2019.9059586

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Abstract

A hybrid diamond/silicon air-clad ridge waveguide platform is demonstrated. The air-clad structure coupled with the wide transmission window of diamond can allow for the use of this architecture over a large wavelength range, especially for the longer infrared wavelengths. In order to provide vertical confinement, the silicon substrate was isotropically etched using S F6 plasma to create undercut diamond films. An in-depth analysis of the etch characteristics of this process was performed to highlight its potential to replace wet isotropic etching or XeF 2 isotropic vapour phase etching techniques. The performance of the waveguide at 1550 nm was measured, and yielded an average loss of 4.67 +/- 0.47 dB/mm.

Item Type:	Conference or Workshop Item (Paper)
Date Type:	Publication
Status:	Published
Schools:	Physics and Astronomy
Publisher:	IEEE
ISBN:	9781728149486
Date of First Compliant Deposit:	12 May 2020
Date of Acceptance:	3 April 2020
Last Modified:	06 Jan 2024 02:37
URI:	https://orca.cardiff.ac.uk/id/eprint/131619

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