Precise control of interface anisotropy during deposition of Co/Pd multilayers

Barton, C. W., Slater, T. J. A. ORCID: https://orcid.org/0000-0003-3840-2454, Rowan-Robinson, R. M., Haigh, S. J., Atkinson, D. and Thomson, T. 2014. Precise control of interface anisotropy during deposition of Co/Pd multilayers. Journal of Applied Physics 116 (20) , 203903. 10.1063/1.4902826

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Abstract

We demonstrate the control of perpendicular magnetic anisotropy (PMA) in multilayer films without modification of either the microstructure or saturation magnetization by tuning the Ar+ ion energy using remote plasma sputtering. We show that for [Co/Pd]8 multilayer films, increasing the Ar+ ion energy results in a strong decrease in PMA through an increase in interfacial roughness determined by X-ray reflectivity measurements. X-ray diffraction and transmission electron microscope image data show that the microstructure is independent of Ar+ energy. This opens a different approach to the in-situ deposition of graded exchange springs and for control of the polarizing layer in hybrid spin transfer torque devices. ACKNOWLEDGMENTS

Item Type:	Article
Date Type:	Publication
Status:	Published
Schools:	Chemistry
Publisher:	American Institute of Physics
ISSN:	0021-8979
Last Modified:	14 Dec 2022 02:11
URI:	https://orca.cardiff.ac.uk/id/eprint/147165

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