Assessing plasma-etched InP laser facet quality

Burman, Tristan T., Cao, Zhongming, Allford, Craig ORCID: https://orcid.org/0000-0002-3798-9014, Baker, Jack, Patel, Jash, Ashraf, Huma, Shutts, Samuel and Smowton, Peter M. ORCID: https://orcid.org/0000-0002-9105-4842 2024. Assessing plasma-etched InP laser facet quality. IEEE Photonics Technology Letters 10.1109/LPT.2024.3397082

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Abstract

This work presents an approach to assess the quality of etched laser facets, considering factors such as roughness, inclination, and non-uniform light emission. Broad area InP lasers, using plasma etched facets, operating at 1550 nm are manufactured with varying facet quality on five 100 mm wafers. Comparison of the threshold current density of lasers of different length was used to derive relative facet reflectivity and demonstrated the relationship between the reflectivity and the optical mode weighted facet roughness and facet inclination.

Item Type:	Article
Date Type:	Published Online
Status:	Published
Schools:	Physics and Astronomy
Publisher:	Institute of Electrical and Electronics Engineers
ISSN:	1041-1135
Date of First Compliant Deposit:	10 May 2024
Date of Acceptance:	7 May 2024
Last Modified:	10 Nov 2024 03:00
URI:	https://orca.cardiff.ac.uk/id/eprint/168836

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