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Silica based polishing of {100} and {111} single crystal diamond

Thomas, Evan L. H., Mandal, Soumen ORCID:, Brousseau, Emmanuel Bruno Jean Paul ORCID: and Williams, Oliver Aneurin ORCID: 2014. Silica based polishing of {100} and {111} single crystal diamond. Science and Technology of Advanced Materials 15 (3) , pp. 1-7. 10.1088/1468-6996/15/3/035013

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Diamond is one of the hardest and most difficult to polish materials. In this paper, the polishing of {111} and {100} single crystal diamond surfaces by standard chemical mechanical polishing, as used in the silicon industry, is demonstrated. A Logitech Tribo Chemical Mechanical Polishing system with Logitech SF1 Syton and a polyurethane/polyester polishing pad was used. A reduction in roughness from 0.92 to 0.23 nm root mean square and 0.31 to 0.09 nm rms for {100} and {111} samples respectively was observed.

Item Type: Article
Date Type: Published Online
Status: Published
Schools: Centre for Advanced Manufacturing Systems At Cardiff (CAMSAC)
Physics and Astronomy
Subjects: Q Science > QC Physics
T Technology > TA Engineering (General). Civil engineering (General)
Additional Information: Pdf uploaded in accordance with the publisher’s policy at 10/07/2014)
Publisher: Institute of Physics
ISSN: 1468-6996
Funders: EPSRC
Date of First Compliant Deposit: 30 March 2016
Date of Acceptance: 4 June 2014
Last Modified: 06 Jan 2024 02:38

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