Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused Ion Beam Etching

Kettle, J., Hoyle, R. T. and Dimov, Stefan Simeonov 2009. Fabrication of Step-and-Flash Imprint Lithography (S-FIL) templates using XeF2 enhanced focused Ion Beam Etching. Journal of Applied Physics A: Materials Science and Processing 96 (4) , pp. 819-825. 10.1007/s00339-009-5319-7

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Item Type:	Article
Schools:	Engineering
ISSN:	0947-8396
Last Modified:	19 Mar 2016 22:12
URI:	https://orca.cardiff.ac.uk/id/eprint/7884

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