The effect of nitrogen on the microstructure, stress and magnetic properties of RF-sputtered Fe-Si-Al(-N) thin films

Snyder, John Evan, Lo, C. C. H., Chen, R., Kriegermeier, B., Leib, J., Lee, S. J., Kramer, M. J. and Jiles, David 2001. The effect of nitrogen on the microstructure, stress and magnetic properties of RF-sputtered Fe-Si-Al(-N) thin films. Journal of Magnetism and Magnetic Materials 226-23 (2) , pp. 1669-1671. 10.1016/S0304-8853(00)00820-9

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Item Type:	Article
Schools:	Engineering
ISSN:	0304-8853
Last Modified:	04 Jun 2017 02:03
URI:	https://orca.cardiff.ac.uk/id/eprint/8110

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