Lewis, S., Wheeler-Jones, R., Haynes, V. and Perks, Richard Marc  ORCID: https://orcid.org/0000-0003-0873-0537
2008.
High density self assembled nanoparticle film with temperature-controllable interparticle spacing for deep sub-wavelength nanolithography using localized surface plasmon modes on planar silver nanoparticle tunable grating.
Microelectronic Engineering
85
(2)
, pp. 486-491.
10.1016/j.mee.2007.09.005
|
Abstract
A novel photolithographic technique using a periodic hexagonal close packed silver nanoparticle 2D array photo mask has been demonstrated to transfer a nano-pattern into a photoresist using G–I line proximity photolithography. This method can be made to precisely control the spacing between nanoparticles by using temperature. The high-density nanoparticle thin film is accomplished by self assembly through the Langmuir-Schaefer (LS) technique on a water surface and then transferring the particle monolayer to a temperature sensitive polymer membrane. A 30 nm hexagonal close packed silver nanoparticle 2D array pattern with a 50 nm period has been successfully transferred into S1813 photoresist using I-line exposure wavelength. The resultant feature sizes were 34 nm with a period of 46 nm, due to the surface plasmon resonance where the S1813 photoresist feature is approximately 11 times smaller than I-line exposure wavelength.
| Item Type: | Article |
|---|---|
| Date Type: | Publication |
| Status: | Published |
| Schools: | Engineering Physics and Astronomy |
| Subjects: | T Technology > TA Engineering (General). Civil engineering (General) |
| Uncontrolled Keywords: | Nanolithography; Nanoparticle; Self assembly; Silver; Surface plasmon resonance |
| Publisher: | Elsevier |
| ISSN: | 0167-9317 |
| Last Modified: | 17 Oct 2022 10:31 |
| URI: | https://orca.cardiff.ac.uk/id/eprint/8272 |
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