Eblabla, Abdalla ![]() ![]() ![]() |
Abstract
This paper presents the development of a lateral AlGaN/GaN Schottky barrier diode (SBD) on free-standing GaN epilayers achieved through Si substrate removal for GaN-on-Si technology. Compared to conventional SBDs on GaN-on-Si, the newly developed free-standing AlGaN/GaN SBDs exhibit enhanced RF performance (cut-off frequency (f C ) and ideality factor (η n ) without compromising DC performance. DC results reveal an onset voltage (V ON ) of 1.34 V, on-resistance (R ON ) of 1.6 Ω•mm, and η n of 1.7 (14% improvement). Reverse-breakdown voltage (V BV ) exceeds 30 V, with a reverse-bias leakage current (I R ) below 38 μA/mm. RF performance demonstrates a f C of 80.2 GHz at zero-bias (11.14% enhancement). The impact of lossy Si substrate coupling effects on RF performance for both SBD structures was studied using 3D-EM simulations for further performance optimisation. These findings imply integrated GaNbased SBDs on Si technology are suitable for high-power and high-temperature system applications at millimetre-wave frequencies, particularly in conjunction with high-thermal coefficient materials such as diamond and AlN.
Item Type: | Conference or Workshop Item (Paper) |
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Date Type: | Published Online |
Status: | Published |
Schools: | Engineering |
Publisher: | IEEE |
ISBN: | 978-2-87487-078-1 |
Last Modified: | 09 Dec 2024 16:46 |
URI: | https://orca.cardiff.ac.uk/id/eprint/173806 |
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