Yan, Zhao, Zhang, Weiwei, Ebert, Martin, Ratiu, Bogdan, Reed, Graham T., Thomson, David J. and Li, Qiang ![]() Item availability restricted. |
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Official URL: http://dx.doi.org/10.1109/IPC60965.2024.10799698
Abstract
Lateral tunnel epitaxy of InP and InAs membranes on silicon-on-insulator (SOI) substrates is demonstrated. The near dislocation-free III-V membranes exhibit smooth growth fronts and are precisely positioned atop silicon (Si) waveguides or the Si device layer.
Item Type: | Conference or Workshop Item (Paper) |
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Date Type: | Published Online |
Status: | In Press |
Schools: | Physics and Astronomy |
Publisher: | IEEE |
ISBN: | 9798350361964 |
ISSN: | 2374-0140 |
Funders: | EPSRC |
Date of First Compliant Deposit: | 3 February 2025 |
Last Modified: | 03 Feb 2025 14:45 |
URI: | https://orca.cardiff.ac.uk/id/eprint/174906 |
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