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Peach, Tomas, Makela, Sanna, Qiao, Dun, Sobiesierski, Angela and Smowton, Peter  ORCID: https://orcid.org/0000-0002-9105-4842
2026.
Hybrid HSQ resist-mask lithography for ultra-low line edge roughness 150 mm InP wafer scale up.
IEEE Transactions on Semiconductor Manufacturing
10.1109/tsm.2026.3727003
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